Publications about Nucleation Studies, Area-Selective Deposition (asD), or Selective Etching

  1. Marcel Junige, Steven M. George:  "Selectivity Between SiO2 and SiNx During Thermal Atomic Layer Etching Using Al(CH3)3/HF and Spontaneous Etching Using HF & Effect of HF+NH3 Co-Dosing".  In:  Chemistry of Materials , (2024).  – DOI:Invited Paper
  2. Marcel Junige, Steven M. George:  "Area-selective molecular layer deposition of nylon 6,2 polyamide: Growth on carbon and inhibition on silica".  In:  Journal of Vacuum Science & Technology A 39, 023204 (2021).  – DOI:10.1116/6.0000769Editor's Pick14 Citations
  3. Marcel Junige, Markus Löffler, Marion Geidel, Matthias Albert, Johann W. Bartha, Ehrenfried Zschech, Bernd Rellinghaus, Willem F. Dorp:  "Area-selective atomic layer deposition of Ru on electron-beam-written Pt(C) patterns versus SiO2 substratum".  In:  Nanotechnology 28, 395301 (2017).  – DOI:10.1088/1361-6528/aa884411 Citations
  4. Marcel Junige, Tim Oddoy, Rositsa Yakimova, Vanya Darakchieva, Christian Wenger, Gregorz Lupina, Julia Kitzmann, Matthias Albert, Johann W. Bartha:  "Atomic layer deposition of Al2O3 on NF3-pre-treated graphene".  In:  Nanotechnology VII : May 4-6, 2015, in Barcelona, Spain ; Proceedings Volume 9519 (Society of Photo-Optical Instrumentation Engineers (SPIE): Barcelona, 2015), 951915.  – DOI:10.1117/12.21812422 Citations
  5. Marion Geidel, Marcel Junige, Matthias Albert, Johann W. Bartha:  "In-situ analysis on the initial growth of ultra-thin ruthenium films with atomic layer deposition".  In:  Microelectronic Engineering 107, 151-155 (2013).  – DOI:10.1016/j.mee.2012.08.02617 Citations