Publications in Peer-Reviewed Scientific Journals and
Multi-Page Contributions in Peer-Reviewed Conference Proceedings

  1. Marcel Junige, Steven M. George:  "Selectivity Between SiO2 and SiNx During Thermal Atomic Layer Etching Using Al(CH3)3/HF and Spontaneous Etching Using HF & Effect of HF+NH3 Co-Dosing".  In:  Chemistry of Materials , (2024).  – DOI:Invited Paper
  2. Michael A. Collings, Marcel Junige, Andrew S. Cavanagh, Victor Wang, Andrew C. Kummel, Steven M. George:  "Electron-enhanced atomic layer deposition of Ru thin films using Ru(DMBD)(CO)3 and effect of forming gas anneal".  In:  Journal of Vacuum Science & Technology A 41, 062408 (2023).  – DOI:10.1116/6.0002938Editor's Pick
  3. Marcel Junige, Steven M. George:  "Area-selective molecular layer deposition of nylon 6,2 polyamide: Growth on carbon and inhibition on silica".  In:  Journal of Vacuum Science & Technology A 39, 023204 (2021).  – DOI:10.1116/6.0000769Editor's Pick14 Citations
  4. Matthew B. E. Griffiths, Zachary S. Dubrawski, Peter G. Gordon, Marcel Junige, Seán T. Barry:  "Thermal ranges and figures of merit for gold-containing precursors for atomic layer deposition".  In:  Journal of Vacuum Science & Technology A 39, 022401 (2021).  – DOI:10.1116/6.0000707
  5. Sebastian Killge, Irene Bartusseck, Marcel Junige, Volker Neumann, Johanna Reif, Christian Wenzel, Mathias Böttcher, Matthias Albert, M. Jürgen Wolf, Johann W. Bartha:  "3D system integration on 300 mm wafer level: High-aspect-ratio TSVs with ruthenium seed layer by thermal ALD and subsequent copper electroplating".  In:  Microelectronic Engineering 205, 20-25 (2019).  – DOI:10.1016/j.mee.2018.11.00614 Citations
  6. Sabbir A. Khan, Dmitry B. Suyatin, Jonas Sundqvist, Mariusz Graczyk, Marcel Junige, Christoffer Kauppinen, Anders Kvennefors, Maria Huffman, Ivan Maximov:  "High-Definition Nanoimprint Stamp Fabrication by Atomic Layer Etching".  In:  ACS Applied Nano Materials 1, 2476-2482 (2018).  – DOI:10.1021/acsanm.8b005097 Citations
  7. Marcel Junige, Markus Löffler, Marion Geidel, Matthias Albert, Johann W. Bartha, Ehrenfried Zschech, Bernd Rellinghaus, Willem F. Dorp:  "Area-selective atomic layer deposition of Ru on electron-beam-written Pt(C) patterns versus SiO2 substratum".  In:  Nanotechnology 28, 395301 (2017).  – DOI:10.1088/1361-6528/aa884411 Citations
  8. Marcel Junige, Tim Oddoy, Rositsa Yakimova, Vanya Darakchieva, Christian Wenger, Gregorz Lupina, Julia Kitzmann, Matthias Albert, Johann W. Bartha:  "Atomic layer deposition of Al2O3 on NF3-pre-treated graphene".  In:  Nanotechnology VII : May 4-6, 2015, in Barcelona, Spain ; Proceedings Volume 9519 (Society of Photo-Optical Instrumentation Engineers (SPIE): Barcelona, 2015), 951915.  – DOI:10.1117/12.21812422 Citations
  9. Marcel Junige, Varun Sharma, Ralf Tanner, Daniel Schmidt, Greg Pribil, Matthias Albert, Mathias Schubert, Johann W. Bartha:  "In-situ real-time monitoring and control of kinetic processes in Atomic Layer Depositions by Spectroscopic Ellipsometry with 1.25 Hz sampling rate".  In:  International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (FCMN) : April 14-16, 2015 in Dresden, Germany (National Institute of Standards and Technology (NIST): Dresden, 2015), 186-188.  – DOI:10.13140/RG.2.1.4138.4485
  10. Christian Wenger, Julia Kitzmann, Andre Wolff, Mirko Fraschke, Christian Walczyk, Gregorz Lupina, Wolfgang Mehr, Marcel Junige, Matthias Albert, Johann W. Bartha:  "Graphene based electron field emitter".  In:  Journal of Vacuum Science & Technology B 33, 01A109 (2015).  – DOI:10.1116/1.490593712 Citations
  11. Marion Geidel, Marcel Junige, Matthias Albert, Johann W. Bartha:  "In-situ analysis on the initial growth of ultra-thin ruthenium films with atomic layer deposition".  In:  Microelectronic Engineering 107, 151-155 (2013).  – DOI:10.1016/j.mee.2012.08.02617 Citations
  12. Martin Knaut, Marcel Junige, Volker Neumann, Henry Wojcik, Thomas Henke, Christoph Hossbach, Andre Hiess, Matthias Albert, Johann W. Bartha:  "Atomic layer deposition for high aspect ratio through silicon vias".  In:  Microelectronic Engineering 107, 80-83 (2013).  – DOI:10.1016/j.mee.2013.01.03137 Citations
  13. Martin Knaut, Marcel Junige, Matthias Albert, Johann W. Bartha:  "In-situ real-time ellipsometric investigations during the atomic layer deposition of ruthenium: A process development from [(ethylcyclopentadienyl)(pyrrolyl)ruthenium] and molecular oxygen".  In:  Journal of Vacuum Science & Technology A 30, 01A151 (2012).  – DOI:10.1116/1.367040530 Citations
  14. Henry Wojcik, Marcel Junige, Johann W. Bartha, Matthias Albert, Volker Neumann, Ulrich Merkel, Anita Peeva, Jürgen Gluch, Siegfried Menzel, Frans Munnik, Romy Liske, Dirk Utess, Inka Richter, Christoph Klein, Hans-Jürgen Engelmann, Paul Ho, Christoph Hossbach, Christian Wenzel:  "Physical Characterization of PECVD and PEALD Ru(-C) Films and Comparison with PVD Ruthenium Film Properties".  In:  Journal of the Electrochemical Society 159, H166-H176 (2012).  – DOI:10.1149/2.066202jes20 Citations
  15. Marcel Junige, Marion Geidel, Martin Knaut, Matthias Albert, Johann W. Bartha:  "Monitoring atomic layer deposition processes in situ and in real-time by spectroscopic ellipsometry".  In:  Semiconductor Conference Dresden (SCD) : September 27-28, 2011, in Dresden, Germany (Institute of Electrical and Electronics Engineers (IEEE): Dresden, 2011), 1-4.  – DOI:10.1109/scd.2011.60687399 Citations
  16. Henry Wojcik, Ulrich Merkel, Andreas Jahn, Karola Richter, Marcel Junige, Christoph Klein, Jürgen Gluch, Matthias Albert, Frans Munnik, Christian Wenzel, Johann W. Bartha:  "Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements".  In:  Microelectronic Engineering 88, 641-645 (2011).  – DOI:10.1016/j.mee.2010.06.0349 Citations

Patents

Academic Theses

  1. Marcel Junige:  “Entwicklung und Charakterisierung eines Prozesses zur thermischen Atomlagenabscheidung von Ruthenium mit in-situ Messtechnik”  (Development and characterisation for a thermal activated atomic layer deposition process of ruthenium via in-situ measurement techniques).  Diploma Thesis (Technische Universität Dresden: January 26, 2011).  – urn:nbn:de:bsz:14-qucosa-65342GLOBALFOUNDRIES Award
  2. Marcel Junige:  “Untersuchung und Optimierung eines plasmagestützten Ruthenium-ALD-Prozesses”  (Investigating and optimizing a plasma-enhanced ALD process for ruthenium).  Student Research Project (Technische Universität Dresden: September 28, 2009).  – DOI:10.2314/GBV:624718476

Supervised Academic Theses and Student Research Projects

  1. Prathibha Raman:  “Advanced aspects of metal atomic layer deposition : Barrier properties against copper diffusion and area selectivity”.  Master’s Thesis (Technische Universität Dresden: January 10, 2019).
    [academic supervisors:  Marcel Junige, Sebastian Killge, Christian Wenzel; Johann W. Bartha]
  2. Abhishek V. Thakur:  “Atomic layer deposition of hafnium oxide : Process development and nucleation study on graphene utilizing in-situ real-time spectroscopic ellipsometry”.  Student Research Project (Technische Universität Dresden: March 16, 2018).
    [academic supervisors:  Marcel Junige, Matthias Albert, Johann W. Bartha]
  3. Johanna Reif:  “In-vacuo Untersuchungen zum initialen Aufwachsverhalten bei der Atomlagenabscheidung mittels Röntgenphotoelektronenspektroskopie und Rastersondentechniken”.  Diploma Thesis (Technische Universität Dresden: January 28, 2016).  GLOBALFOUNDRIES Award
    [academic supervisors:  Marion Geidel, Marcel Junige, Johann W. Bartha]
  4. Ralf Tanner:  “Requalifying a reactor for the Atomic Layer Deposition of Aluminium Oxide, Tantalum Nitride, as well as Ruthenium”.  Student Research Project (Technische Universität Dresden: November 30, 2015).
    [academic supervisors:  Marcel Junige, Johann W. Bartha]
  5. Shashank Balasubramanyam:  “Growth behavior and functional film properties in Atomic Layer Deposition”.  Master’s Thesis (Technische Universität Chemnitz: February 20, 2015).
    [academic supervisors:  Marcel Junige, Thomas Wächtler, Stefan E. Schulz, Johann W. Bartha]
  6. Tim Oddoy:  “Untersuchung zum Anfangswachstum der Atomlagenabscheidung ultra-dünner dielektrischer Schichten auf einer Graphen-Monolage”.  Interdisciplinary Student Research Project (Technische Universität Dresden: September 22, 2014).
    [academic supervisors:  Marcel Junige, Volker Neumann, Johann W. Bartha]
  7. Varun Sharma:  “Spectroscopic Ellipsometry for the in-situ investigation of Atomic Layer Depositions”.  Student Research Project (Technische Universität Dresden: April 30, 2014).  – urn:nbn:de:bsz:14-qucosa-146530
    [academic supervisors:  Marcel Junige, Martin Knaut, Johann W. Bartha]
  8. Tillmann F. Walther:  “Beeinflussung funktionaler Schichteigenschaften bei der thermischen Atomlagenabscheidung von Tantalnitrid sowie Ruthenium”.  Diploma Thesis (Technische Universität Dresden: March 14, 2014).  – urn:nbn:de:bsz:14-qucosa-167301
    [academic supervisors:  Marcel Junige, Christoph Klaus, Johann W. Bartha]

Invited Presentations, Tutorials, and Lectures
at International Advanced Schools, Workshops, or Symposia

  1. Marcel Junige, Steven M. George:  “Gas-Phase Methods for Selective Thermal Atomic Layer Etching of Si-Based Materials”.  In:  Industry Strategy Symposium (ISS) : January 07–10, 2024, in Half Moon Bay, CA, USA (SEMI: 2024).  Invited Poster & 2-min Pitch
  2. Marcel Junige:  “In-situ metrology techniques in ALD”.  In:  Workshop “ALD for Industry” : January 17–18, 2017, in Dresden, Germany (European Society of Thin Films (EFDS): Dresden, 2017).  Invited 30-min Tutorial
  3. Marcel Junige, Jonas Sundqvist:  “Chemical path to Atomic Layer Etching”.  In:  Novel high-k application workshop : March 14–15, 2016, in Dresden, Germany. (Nano-electronic Materials Laboratory gGmbH (NaMLab): 2016).  Invited Talk
  4. Marcel Junige:  “In-situ characterization for ALD/MLD”.  In:  Summer School “Atomic Layer Deposition: Method and Applications” : July 6–10, 2015, in Brescia, Italy (COST Action MP1402 – Hooking together European research in Atomic Layer Deposition (HERALD): 2015).  Invited 90-min Lecture

Oral or Poster Contributions
at Internationally Established, Peer-Reviewed Conferences and Workshops