Publications about Atomic Layer Deposition (ALD)

  1. Michael A. Collings, Marcel Junige, Andrew S. Cavanagh, Victor Wang, Andrew C. Kummel, Steven M. George:  "Electron-Enhanced Atomic Layer Deposition of Ru Thin Films Using Ru(DMBD)(CO)3 and Effect of Forming Gas Anneal".  In:  Journal of Vacuum Science & Technology A 41, 062408 (2023).  – DOI:10.1116/6.0002938  Editor's Pick  1 Citations
  2. Matthew B. E. Griffiths, Zachary S. Dubrawski, Peter G. Gordon, Marcel Junige, Seán T. Barry:  "Thermal Ranges and Figures of Merit for Gold-Containing Precursors for Atomic Layer Deposition".  In:  Journal of Vacuum Science & Technology A 39, 022401 (2021).  – DOI:10.1116/6.0000707  1 Citations
  3. Sebastian Killge, Irene Bartusseck, Marcel Junige, Volker Neumann, Johanna Reif, Christian Wenzel, Mathias Böttcher, Matthias Albert, M. Jürgen Wolf, Johann W. Bartha:  "3D System Integration on 300 mm Wafer Level: High-Aspect-Ratio TSVs with Ruthenium Seed Layer by Thermal ALD and Subsequent Copper Electroplating".  In:  Microelectronic Engineering 205, 20-25 (2019).  – DOI:10.1016/j.mee.2018.11.006  18 Citations
  4. Marcel Junige, Markus Löffler, Marion Geidel, Matthias Albert, Johann W. Bartha, Ehrenfried Zschech, Bernd Rellinghaus, Willem F. van Dorp:  "Area-Selective Atomic Layer Deposition of Ru on Electron-Beam-Written Pt(C) Patterns versus SiO2 Substratum".  In:  Nanotechnology 28, 395301 (2017).  – DOI:10.1088/1361-6528/aa8844  14 Citations
  5. Marcel Junige, Tim Oddoy, Rositsa Yakimova, Vanya Darakchieva, Christian Wenger, Gregorz Lupina, Julia Kitzmann, Matthias Albert, Johann W. Bartha:  "Atomic Layer Deposition of Al2O3 on NF3-Pre-Treated Graphene".  In:  Nanotechnology VII : May 4-6, 2015, in Barcelona, Spain ; Proceedings Volume 9519 (Society of Photo-Optical Instrumentation Engineers (SPIE): Barcelona, 2015), 951915.  – DOI:10.1117/12.2181242  3 Citations
  6. Marcel Junige, Varun Sharma, Ralf Tanner, Daniel Schmidt, Greg Pribil, Matthias Albert, Mathias Schubert, Johann W. Bartha:  "In-Situ Real-Time Monitoring and Control of Kinetic Processes in Atomic Layer Depositions by Spectroscopic Ellipsometry with 1.25 Hz Sampling Rate".  In:  International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (FCMN) : April 14-16, 2015 in Dresden, Germany (National Institute of Standards and Technology (NIST): Dresden, 2015), 186-188.  – DOI:10.13140/RG.2.1.4138.4485
  7. Christian Wenger, Julia Kitzmann, Andre Wolff, Mirko Fraschke, Christian Walczyk, Gregorz Lupina, Wolfgang Mehr, Marcel Junige, Matthias Albert, Johann W. Bartha:  "Graphene Based Electron Field Emitter".  In:  Journal of Vacuum Science & Technology B 33, 01A109 (2015).  – DOI:10.1116/1.4905937  12 Citations
  8. Martin Knaut, Marcel Junige, Volker Neumann, Henry Wojcik, Thomas Henke, Christoph Hossbach, Andre Hiess, Matthias Albert, Johann W. Bartha:  "Atomic Layer Deposition for High Aspect Ratio Through Silicon Vias".  In:  Microelectronic Engineering 107, 80-83 (2013).  – DOI:10.1016/j.mee.2013.01.031  40 Citations
  9. Marion Geidel, Marcel Junige, Matthias Albert, Johann W. Bartha:  "In-Situ Analysis on the Initial Growth of Ultra-Thin Ruthenium Films with Atomic Layer Deposition".  In:  Microelectronic Engineering 107, 151-155 (2013).  – DOI:10.1016/j.mee.2012.08.026  17 Citations
  10. Martin Knaut, Marcel Junige, Matthias Albert, Johann W. Bartha:  "In-Situ Real-Time Ellipsometric Investigations during the Atomic Layer Deposition of Ruthenium: A Process Development from [(EthylCyclopentadienyl)(Pyrrolyl)Ruthenium] and Molecular Oxygen".  In:  Journal of Vacuum Science & Technology A 30, 01A151 (2012).  – DOI:10.1116/1.3670405  30 Citations
  11. Henry Wojcik, Marcel Junige, Johann W. Bartha, Matthias Albert, Volker Neumann, Ulrich Merkel, Anita Peeva, Jürgen Gluch, Siegfried Menzel, Frans Munnik, Romy Liske, Dirk Utess, Inka Richter, Christoph Klein, Hans-Jürgen Engelmann, Paul Ho, Christoph Hossbach, Christian Wenzel:  "Physical Characterization of PECVD and PEALD Ru(-C) Films and Comparison with PVD Ruthenium Film Properties".  In:  Journal of the Electrochemical Society 159, H166-H176 (2012).  – DOI:10.1149/2.066202jes  22 Citations
  12. Marcel Junige, Marion Geidel, Martin Knaut, Matthias Albert, Johann W. Bartha:  "Monitoring Atomic Layer Deposition Processes In Situ and in Real-Time by Spectroscopic Ellipsometry".  In:  Semiconductor Conference Dresden (SCD) : September 27-28, 2011, in Dresden, Germany (Institute of Electrical and Electronics Engineers (IEEE): Dresden, 2011), 1-4.  – DOI:10.1109/scd.2011.6068739  9 Citations
  13. Henry Wojcik, Ulrich Merkel, Andreas Jahn, Karola Richter, Marcel Junige, Christoph Klein, Jürgen Gluch, Matthias Albert, Frans Munnik, Christian Wenzel, Johann W. Bartha:  "Comparison of PVD, PECVD & PEALD Ru(-C) Films as Cu Diffusion Barriers by Means of Bias Temperature Stress Measurements".  In:  Microelectronic Engineering 88, 641-645 (2011).  – DOI:10.1016/j.mee.2010.06.034  10 Citations