Publications about Atomic Layer Etching (ALE)

  1. Marcel Junige, Steven M. George:  "Selectivity Between SiO2 and SiNx During Thermal Atomic Layer Etching Using Al(CH3)3/HF and Spontaneous Etching Using HF & Effect of HF+NH3 Co-Dosing".  In:  Chemistry of Materials xx, xx (2024).  – DOI:10.1021/acs.chemmater.4c01040Invited Paper
  2. Sabbir A. Khan, Dmitry B. Suyatin, Jonas Sundqvist, Mariusz Graczyk, Marcel Junige, Christoffer Kauppinen, Anders Kvennefors, Maria Huffman, Ivan Maximov:  "High-Definition Nanoimprint Stamp Fabrication by Atomic Layer Etching".  In:  ACS Applied Nano Materials 1, 2476-2482 (2018).  – DOI:10.1021/acsanm.8b005098 Citations