Publications about Atomic Layer Etching (ALE)

  1. Samantha M. Rau, Rebecca J. Hirsch, Marcel Junige, Andrew S. Cavanagh, Antonio L. P. Rotondaro, Hanna Paddubrouskaya, Kate H. Abel, Steven M. George:  "Strongly and Weakly Adsorbed H2O Layer Thicknesses on Hydroxylated SiO2 Surfaces versus H2O Pressure at Various Substrate Temperatures".  In:  The Journal of Physical Chemistry C 129, 1666-1677 (2025).  – DOI:10.1021/acs.jpcc.4c06859  Invited Paper
  2. Marcel Junige, Steven M. George:  "Selectivity Between SiO2 and SiNx During Thermal Atomic Layer Etching Using Al(CH3)3/HF and Spontaneous Etching Using HF & Effect of HF+NH3 Co-Dosing".  In:  Chemistry of Materials 36, 6950-6960 (2024).  – DOI:10.1021/acs.chemmater.4c01040  Invited Paper  2 Citations
  3. Sabbir A. Khan, Dmitry B. Suyatin, Jonas Sundqvist, Mariusz Graczyk, Marcel Junige, Christoffer Kauppinen, Anders Kvennefors, Maria Huffman, Ivan Maximov:  "High-Definition Nanoimprint Stamp Fabrication by Atomic Layer Etching".  In:  ACS Applied Nano Materials 1, 2476-2482 (2018).  – DOI:10.1021/acsanm.8b00509  8 Citations