Publications about Atomic Layer Etching (ALE)
- Samantha M. Rau, Rebecca J. Hirsch, Marcel Junige, Andrew S. Cavanagh, Antonio L. P. Rotondaro, Hanna Paddubrouskaya, Kate H. Abel, Steven M. George: "Strongly and Weakly Adsorbed H2O Layer Thicknesses on Hydroxylated SiO2 Surfaces versus H2O Pressure at Various Substrate Temperatures". In: The Journal of Physical Chemistry C 129, 1666-1677 (2025). – DOI:10.1021/acs.jpcc.4c06859 Invited Paper
- Marcel Junige, Steven M. George: "Selectivity Between SiO2 and SiNx During Thermal Atomic Layer Etching Using Al(CH3)3/HF and Spontaneous Etching Using HF & Effect of HF+NH3 Co-Dosing". In: Chemistry of Materials 36, 6950-6960 (2024). – DOI:10.1021/acs.chemmater.4c01040 Invited Paper 2 Citations
- Sabbir A. Khan, Dmitry B. Suyatin, Jonas Sundqvist, Mariusz Graczyk, Marcel Junige, Christoffer Kauppinen, Anders Kvennefors, Maria Huffman, Ivan Maximov: "High-Definition Nanoimprint Stamp Fabrication by Atomic Layer Etching". In: ACS Applied Nano Materials 1, 2476-2482 (2018). – DOI:10.1021/acsanm.8b00509 8 Citations