Publications about Atomic Layer Etching (ALE) and Spontaneous or Chemical Vapor Etching (CVE)

  1. Samantha M. Rau, Rebecca J. Hirsch, Marcel Junige, Andrew S. Cavanagh, Antonio L. P. Rotondaro, Hanna Paddubrouskaya, Kate H. Abel, Steven M. George:  "Strongly and Weakly Adsorbed H2O Layer Thicknesses on Hydroxylated SiO2 Surfaces versus H2O Pressure at Various Substrate Temperatures".  In:  The Journal of Physical Chemistry C 129, 1666-1677 (2025).  – DOI:10.1021/acs.jpcc.4c06859  Invited Paper  1 Citations
  2. Marcel Junige, Steven M. George:  "Selectivity Between SiO2 and SiNx During Thermal Atomic Layer Etching Using Al(CH3)3/HF and Spontaneous Etching Using HF & Effect of HF+NH3 Co-Dosing".  In:  Chemistry of Materials 36, 6950-6960 (2024).  – DOI:10.1021/acs.chemmater.4c01040  Invited Paper  9 Citations
  3. Sabbir A. Khan, Dmitry B. Suyatin, Jonas Sundqvist, Mariusz Graczyk, Marcel Junige, Christoffer Kauppinen, Anders Kvennefors, Maria Huffman, Ivan Maximov:  "High-Definition Nanoimprint Stamp Fabrication by Atomic Layer Etching".  In:  ACS Applied Nano Materials 1, 2476-2482 (2018).  – DOI:10.1021/acsanm.8b00509  9 Citations