Publications in Peer-Reviewed Scientific Journals, and

Multi-Page Contributions in Peer-Reviewed Conference Proceedings

In line with each publication are indicated the journal’s IF (impact factor) from InCites™ Journal Citation Reports® 2016 and the number of attracted citations on Scopus® (as of September 2017). For comparability purposes, the 2016 median IF was 2.535 in the category “Nanoscience & Nanotechnology”.

  1. Junige, Marcel ; George, Steven M.:  Area-selective molecular layer deposition of nylon 6,2 polyamide: Growth on carbon and inhibition on silica.  In:  J. Vac. Sci. Technol. A 39, 023204 (2021). – DOI:10.1116/6.0000769  [IF: 2.166]
  2. Griffiths, Matthew B. E. ; Dubrawski, Zachary S. ; Gordon, Peter G. ; Junige, Marcel ; Barry, Seán T.:  Thermal ranges and figures of merit for gold-containing precursors for atomic layer deposition.  In:  J. Vac. Sci. Technol. A 39, 022401 (2021). – DOI:10.1116/6.0000707  [IF: 2.166]
  3. Killge, Sebastian ; Bartusseck, Irene ; Junige, Marcel ; Neumann, Volker ; Reif, Johanna ; Wenzel, Christian ; Böttcher, Mathias ; Albert, Matthias ; Wolf, M. Jürgen ; Bartha, Johann W.:  3D system integration on 300 mm wafer level: High-aspect-ratio TSVs with ruthenium seed layer by thermal ALD and subsequent copper electroplating.  In:  Microelectron. Eng. 205, 20–25 (2019). – DOI:10.1016/j.mee.2018.11.006  [IF: 1.806]
  4. Khan, Sabbir A. ; Suyatin, Dmitry B. ; Sundqvist, Jonas ; Graczyk, Mariusz ; Junige, Marcel ; Kauppinen, Christoffer ; Kvennefors, Anders ; Huffman, Maria ; Maximov, Ivan:  High-definition nanoimprint stamp fabrication by atomic layer etching.  In:  ACS Appl. Nano Mater. 1, 2476 (2018). – DOI:10.1021/acsanm.8b00509
  5. Junige, Marcel ; Löffler, Markus ; Geidel, Marion ; Albert, Matthias ; Bartha, Johann W. ; Zschech, Ehrenfried ; Rellinghaus, Bernd ; Dorp, Willem F. van:  Area-selective atomic layer deposition of Ru on electron-beam-written Pt(C) patterns versus SiO2 substratum.  In:  Nanotechnology 28, 395301 (2017). – DOI:10.1088/1361-6528/aa8844  [IF: 3.440]
  6. Junige, Marcel ; Oddoy, Tim ; Yakimova, Rositsa ; Darakchieva, Vanya ; Wenger, Christian ; Lupina, Grzegorz ; Kitzmann, Julia ; Albert, Matthias ; Bartha, Johann W.:  Atomic layer deposition of Al2O3 on NF3-pre-treated graphene.  In:  Tiginyanu, Ion M. (ed.): Nanotechnology VII : May 4-6, 2015 in Barcelona, Spain ( SPIE 9519), 951915 (2015, Barcelona: SPIE (the international society for optics and photonics)). – DOI:10.1117/12.2181242  [citations: 1]
  7. Junige, Marcel ; Sharma, Varun ; Tanner, Ralf ; Schmidt, Daniel ; Pribil, Greg ; Albert, Matthias ; Schubert, Mathias ; Bartha, Johann W.:  In‑situ real-time monitoring and control of kinetic processes in atomic layer depositions by spectroscopic ellipsometry with 1.25 Hz sampling rate.  In:  FCMN (International Conference on Frontiers of Characterization and Metrology for Nanoelectronics) : April 14-16, 2015 in Dresden, Germany, 1–4 (2015, Dresden: NIST (National Institute of Standards and Technology)). – DOI:10.13140/RG.2.1.4138.4485
  8. Wenger, Christian ; Kitzmann, Julia ; Wolff, André ; Fraschke, Mirko ; Walczyk, Christian ; Lupina, Grzegorz ; Mehr, Wolfgang ; Junige, Marcel ; Albert, Matthias ; Bartha, Johann W.:  Graphene based electron field emitter.  In:  J. Vac. Sci. Technol., B 33, 01A109 (2015). – DOI:10.1116/1.4905937  [IF: 1.573, citations: 3]
  9. Geidel, Marion ; Junige, Marcel ; Albert, Matthias ; Bartha, Johann W.:  In-situ analysis on the initial growth of ultra-thin ruthenium films with atomic layer deposition.  In:  Microelectron. Eng. 107, 151–155 (2013). – DOI:10.1016/j.mee.2012.08.026  [IF: 1.806, citations: 7]
  10. Knaut, Martin ; Junige, Marcel ; Neumann, Volker ; Wojcik, Henry ; Henke, Thomas ; Hossbach, Christoph ; Hiess, André ; Albert, Matthias ; Bartha, Johann W.:  Atomic layer deposition for high aspect ratio through silicon vias.  In:  Microelectron. Eng. 107, 80–83 (2013). – DOI:10.1016/j.mee.2013.01.031  [IF: 1.806, citations: 8]
  11. Knaut, Martin ; Junige, Marcel ; Albert, Matthias ; Bartha, Johann W.: In-situ real-time ellipsometric investigations during the atomic layer deposition of ruthenium:  A process development from [(ethylcyclopentadienyl)­(pyrrolyl)­ruthenium] and molecular oxygen.  In:  J. Vac. Sci. Technol., A 30, 01A151 (2012). – DOI:10.1116/1.3670405  [IF: 1.374, citations: 16]
  12. Wojcik, Henry ; Junige, Marcel ; Bartha, Johann W. ; Albert, Matthias ; Neumann, Volker ; Merkel, Ulrich ; Peeva, A. ; Gluch, Jürgen ; Menzel, Siegfried ; Munnik, Frans ; Liske, Romy ; Utess, D. ; Richter, I. ; Klein, Christoph ; Engelmann, Hans-Jürgen ; Ho, Paul S. ; Hossbach, Christoph ; Wenzel, Christian:  Physical characterization of PECVD and PEALD Ru(-C) films and comparison with PVD ruthenium film properties.  In:  J. Electrochem. Soc. 159, H166–H176 (2012). – DOI:10.1149/2.066202jes  [IF: 3.259, citations: 9]
  13. Junige, Marcel ; Geidel, Marion ; Knaut, Martin ; Albert, Matthias ; Bartha, Johann W.:  Monitoring atomic layer deposition processes in situ and in real-time by spectroscopic ellipsometry.  In:  SCD (Semiconductor Conference Dresden) : September 27-28, 2011 in Dresden, Germany, 1–4 (2011, Dresden: IEEE (Institute of Electrical and Electronics Engineers)). – DOI:10.1109/SCD.2011.6068739  [citations: 2]
  14. Wojcik, Henry ; Merkel, Ulrich ; Jahn, Andreas ; Richter, Karola ; Junige, Marcel ; Klein, Christoph ; Gluch, Jürgen ; Albert, Matthias ; Munnik, Frans ; Wenzel, Christian:  Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements.  In:  Microelectron. Eng. 88, 641–645 (2011). – DOI:10.1016/j.mee.2010.06.034  [IF: 1.806, citations: 7]


Academic Theses

academic theses, book chapters, and research monographs

  1. Junige, Marcel ; Kitzmann, Julia ; Strobel, Carsten ; Lukosius, Mindaugas ; Löffler, Markus ; Thakur, Abhishekkumar Vijaysingh ; Chavarin, Carlos A. ; Geidel, Marion ; Reif, Johanna ; Albert, Matthias ; Lupina, Grzegorz ; Wenger, Christian ; Bartha, Johann W.: Processing technologies and metrology towards the integration of graphene in nanoelectronics. In: Tiwari, A. (ed.): Advanced Materials Series : Handbook on the Graphene Materials (Wiley-Scrivener). – abstract accepted; manuscript in preparation
  2. Junige, Marcel:  Entwicklung und Charakterisierung eines Prozesses zur thermischen Atomlagenabscheidung von Ruthenium mit in-situ Messtechnik.  (Development and characterisation for a thermal activated atomic layer deposition process of ruthenium via in-situ measurement techniques.)  Dresden, Technische Universität Dresden, diploma thesis (January 26, 2011). – urn:nbn:de:bsz:14-qucosa-65342
  3. Junige, Marcel:  Untersuchung und Optimierung eines plasmagestützten Ruthenium-ALD-Prozesses.  (Investigating and optimizing a plasma-enhanced ALD process for ruthenium).  Dresden, Technische Universität Dresden, student research project (September 28, 2009). – DOI:10.2314/GBV:624718476

Supervised Student Research Projects and Theses

  1. Raman, Prathibha:  Advanced aspects of metal atomic layer deposition : Barrier properties against copper diffusion and area selectivity.  Dresden, Technische Universität Dresden, master thesis (January 10, 2019).  [academic supervisors: Junige, Marcel ; Killge, Sebastian ; Wenzel, Christian ; Bartha, Johann W.]
  2. Thakur, Abhishek V.:  Atomic layer deposition of hafnium oxide : Process development and nucleation study on graphene utilizing in-situ real-time spectroscopic ellipsometry.  Dresden, Technische Universität Dresden, student research project (March 16, 2018).  [academic supervisors: Junige, Marcel ; Albert, Matthias ; Bartha, Johann W.]
  3. Reif, Johanna:  In-vacuo Untersuchungen zum initialen Aufwachsverhalten bei der Atomlagenabscheidung mittels Röntgenphotoelektronenspektroskopie und Rastersondentechniken.  Dresden, Technische Universität Dresden, diploma thesis (January 28, 2016).  [academic supervisors: Geidel, Marion ; Junige, Marcel ; Bartha, Johann W.]
  4. Tanner, Ralf:  Requalifying a reactor for the Atomic Layer Deposition of Aluminium Oxide, Tantalum Nitride, as well as Ruthenium.  Dresden, Technische Universität Dresden, student research project (November 30, 2015).  [academic supervisors: Junige, Marcel ; Bartha, Johann W.]
  5. Balasubramanyam, Shashank:  Growth behavior and functional film properties in Atomic Layer Deposition.  Chemnitz, Technische Universität Chemnitz, master thesis (February 20, 2015).  [academic supervisors: Junige, Marcel ; Wächtler, Thomas ; Schulz, Stefan E. ; Bartha, Johann W.]
  6. Oddoy, Tim:  Untersuchung zum Anfangswachstum der Atomlagenabscheidung ultra-dünner dielektrischer Schichten auf einer Graphen-Monolage.  Dresden, Technische Universität Dresden, interdisciplinary student research project (September 22, 2014).  [academic supervisors: Junige, Marcel ; Neumann, Volker ; Bartha, Johann W.]
  7. Sharma, Varun:  Spectroscopic Ellipsometry for the in-situ investigation of Atomic Layer Depositions.  Dresden, Technische Universität Dresden, student research project (April 30, 2014). – urn:nbn:de:bsz:14-qucosa-146530  [academic supervisors: Junige, Marcel ; Knaut, Martin ; Bartha, Johann W.]
  8. Walther, Tillmann F.:  Beeinflussung funktionaler Schichteigenschaften bei der thermischen Atomlagenabscheidung von Tantalnitrid sowie Ruthenium.  Dresden, Technische Universität Dresden, diploma thesis (March 14, 2014). – urn:nbn:de:bsz:14-qucosa-167301  [academic supervisors: Junige, Marcel ; Klaus, Christoph ; Bartha, Johann W.]

Invited Presentations, Tutorials, and Lectures to International Advanced Schools and Workshops

  1. Junige, Marcel:  In-situ metrology techniques in ALD.  In:  Workshop “ALD for Industry” : January 17–18, 2017 in Dresden, Germany (2017, Dresden: EFDS (European Society of Thin Films)).  [invited 30-min tutorial]
  2. Junige, Marcel ; Sundqvist, Jonas:  Chemical path to Atomic Layer Etching.  In:  Novel high-k application workshop : March 14–15, 2016 in Dresden, Germany. (2016, Dresden: NaMLab (Nano-electronic Materials Laboratory gGmbH)).  [invited presentation]
  3. Junige, Marcel:  In-situ characterization for ALD/MLD.  In:  Summer School “Atomic Layer Deposition: Method and Applications” : July 6–10, 2015 in Brescia, Italy (2015, Brescia: HERALD (COST Action MP1402 – Hooking together European research in Atomic Layer Deposition)).  [invited 90-min lecture]

oral or poster contributions at internationally established, peer-reviewed workshops and conferences