research interests & level of expertise

ALP (Ångström-level processing)

surface modification

since 2008: 
ALD (atomic layer deposition)
of oxides (Al₂O₃, HfO₂, Ta₂O₅, RuO₂), nitrides (Ta_xN_y), and metals (Ru, Au), including

• precursor evaluations
• process developments
• reaction mechanism studies
• nucleation & selectivity studies;

advanced level

since 2017:
ALE (atomic layer etching)

surface analyses/ metrology

in situ

since 2008:
SE (spectroscopic ellipsometry),
especially with real-time sampling > 1 Hz;
advanced level

in vacuo

since 2010: 
PES (photo-electron spectroscopy)

• XPS( x-ray photo-electron spectroscopy);
  expert level
• UPS (ultraviolet photo-electron spectroscopy)

since 2013:
SPM (scanning probe microscopy)

• AFM (atomic force microscopy);
  expert level
• STM (scanning tunneling microscopy), including
  STS (scanning tunneling spectroscopy)

on site

since 2009:
QMS (quadrupol mass spectrometry)

ex situ 

since 2009:
electrical characterization, such as

• 4PP (four-point probe)
• current–voltage
• capacitance–voltage
• TVS BTS (triangular voltage sweep under bias and temperature stress)

since 2011:
XRD (x-ray diffraction)

since 2011:
XRR (x-ray reflectometry)

since 2015:
Raman spectroscopy

nano-technology

nano-manufacturing

nano-fabrication

nano-characterization

nano-electronics

nano-materials

thin films

materials science

since 2008:
ruthenium and ruthenium oxide

since 2013:
high-k oxides (Al₂O₃, HfO₂, Ta₂O₅)

since 2013:
graphene

vacuum technology

since 2008:
high- and ultra-high vacuum components, such as

• various pump types & sizes
• cross-flow & showerhead reactor designs
• seals, gas tubes, fittings, valves
• drives
• heaters, etc.

physical chemistry

surface chemistry

chemical physics

physics of condensed matter

optics