research interests & level of expertise
ALP (Ångström-level processing)
surface modification
since 2008:
ALD (atomic layer deposition)
of oxides (Al2O3, Ta2O5, RuO2), nitrides (TaxNy), and metals (Ru, Au), including
- precursor evaluations
- process developments
- reaction mechanism studies
- nucleation & selectivity studies;
advanced level
since 2017:
ALE (atomic layer etching)
surface analyses/ metrology
in situ
since 2008:
SE (spectroscopic ellipsometry),
especially with real-time sampling > 1 Hz;
advanced level
in vacuo
since 2010:
PES (photo-electron spectroscopy)
- XPS( x-ray photo-electron spectroscopy);
expert level - UPS (ultraviolet photo-electron spectroscopy)
since 2013:
SPM (scanning probe microscopy)
- AFM (atomic force microscopy);
expert level - STM (scanning tunneling microscopy), including
STS (scanning tunneling spectroscopy)
on site
since 2009:
QMS (quadrupol mass spectrometry)
ex situ
since 2009:
electrical characterization, such as
- 4PP (four-point probe)
- current–voltage
- capacitance–voltage
- TVS BTS (triangular voltage sweep under bias and temperature stress)
since 2011:
XRD (x-ray diffraction)
since 2011:
XRR (x-ray reflectometry)
since 2015:
Raman spectroscopy
nano-technology
nano-manufacturing
nano-fabrication
nano-characterization
nano-electronics
nano-materials
thin films
materials science
since 2008:
ruthenium and ruthenium oxide
since 2013:
graphene
vacuum technology
since 2008:
high- and ultra-high vacuum components, such as
- various pump types & sizes
- cross-flow & showerhead reactor designs
- seals, gas tubes, fittings, valves
- drives
- heaters, etc.
physical chemistry
surface chemistry
chemical physics